評価方法Materials and methods
Both 2 um and 5 um line/space are finely defined using PEI-38 i-line type photoresist at 0.8 um thickness
2. UV intensity is evaluated using the UV detector of UVD-405PD from Ushio Inc.
3. UV uniformity is evaluated using 5 points index( the center and 4 quadrant points which are 10 mm from wafer edge).
4. Misalignment is evatuated the eccentricity of the alignment.