Technical Data* for
Manual mask aligner
Model: UV400-LED
Wafer size: up to 2"
Mask size: 5" glass
Photoresist: Both g- and i- line type
UV intensity: 3 mW/cm^2
UV uniformity: +/-50%
Exposure: Contact mode
Focus: Autofocus mode and manual mode
Resolution: 2 um
Misalignment: <4 um(frontside), <8
um(backside or infrared)
Working distance: 32 mm(alignment),
up to 400 mm(exposure)
Dimension: w0.36 m x d0.3 m x h0.58
m
Weight: 10 Kg
AC power: < 1 A @ 100-240 V
Vacuum/Air: Not necessary
Optional
Vacuum chunk
Chunk for irregular substrate
*Specifications may be
changed without prior notice.
Materials and methods are discribed
here.